Holistic optimization architecture enabling sub-14-nm projection lithography-Reference-Cited by-同舟云学术

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Holistic optimization architecture enabling sub-14-nm projection lithography

Published:2014-01-07 Issue:1 Volume:13 Page:011006
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Mulkens Jan,Hinnen Paul,Kubis Michael,Padiy Alexander,Benschop Jos

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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