Directed self-assembly cut mask assignment for unidirectional design-Reference-Cited by-同舟云学术

Directed self-assembly cut mask assignment for unidirectional design

Published:2015-08-07 Issue:3 Volume:14 Page:031211
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ou Jiaojiao¹,Yu Bei²,Gao Jhih-Rong³,Pan David Z.¹

Affiliation:

1. University of Texas at Austin, Department of Electrical and Computer Engineering, Austin, Texas 78712, United States

2. University of Texas at Austin, Department of Electrical and Computer Engineering, Austin, Texas 78712, United StatesbChinese University of Hong Kong, Department of Computer Science and Engineering, Shatin, Hong Kong

3. Cadence Design Systems, 12515-7 Research Boulevard, Austin, Texas 78759, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. The daunting complexity of scaling to 7NM without EUV: pushing DTCO to the extreme

2. Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings

3. Standard cell layout regularity and pin access optimization considering middle-of-line;Ye,2015

4. Design for Manufacturing With Emerging Nanolithography

5. Layout decomposition for quadruple patterning lithography and beyond;Yu,2014

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