Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, integer programming formulations, and numerical experiments-Reference-Cited by-同舟云学术

Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, integer programming formulations, and numerical experiments

Published:2020-01 Issue:2 Volume:280 Page:453-468
ISSN:0377-2217
Container-title:European Journal of Operational Research
language:en
Short-container-title:European Journal of Operational Research

Author:

Ait-Ferhat Dehia,Juliard Vincent,Stauffer Gautier^ORCID,Torres Juan Andres

Funder

Association Nationale de la Recherche et de la Technologie

Publisher

Elsevier BV

Subject

Information Systems and Management,Management Science and Operations Research,Modelling and Simulation,General Computer Science,Industrial and Manufacturing Engineering

Reference43 articles.

1. Ait-Ferhat, D. (2018). Design of exact solutions for the manufacturing of ‘vias’ using DSA technology. https://tel.archives-ouvertes.fr/tel-02171255.

2. Ait-Ferhat, D., Juliard, V., Stauffer, G., & Torres, J. A. (2019). The k-path coloring problem in graphs with bounded treewidth: an application in integrated circuit manufacturing. CoRR abs/1904.11805.

3. Path chromatic numbers of graphs;Akiyama;Journal of Graph Theory,1989

4. Badr, Y. (2017). Co-optimization of restrictive patterning technologies and design. UCLA. ProQuest ID: Badr_ucla_0031D_16032. Merritt ID: ark:/13030/m5324r9n. Retrieved from https://escholarship.org/uc/item/5wz217k7.

5. Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias;Badr,2015

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