Improvement of depth of focus control using wafer geometry-Reference-Cited by-同舟云学术

Improvement of depth of focus control using wafer geometry

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Lee Honggoo,Lee Jongsu,Kim Sangmin,Lee Changhwan,Han Sangjun,Kim Myoungsoo,Kwon Wontaik,Park Sung-Ki,Veeraraghavan Sathish,Kim JH,Awasthi Amartya,Byeon Jungho,Mueller Dieter,Sinha Jaydeep

Publisher

SPIE

Reference7 articles.

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2. Approaching New Metrics for Wafer Flatness: An Investigation of the Lithography Consequences of Wafer Non-Flatness;Valley,2004

3. Wafer Geometry and Lithography Focus Performance for Advanced Nodes – Preliminary Results;Brinkhof,2011

4. International Technology Roadmap for Semiconductors, 2011 Edition, Table LITH2. http://www.itrs.net/Links/2012ITRS/2012Tables/Litho_2012Tables.xlsx

5. Mechanics Modeling of Nanotopography Effects on CMP;Vukkadala,2010

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