Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors-Reference-Cited by-同舟云学术

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Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors

Published:2016-03-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Gao Haiyong¹,Chung Woong Jae¹,Aung Nyan¹,Subramany Lokesh¹,Samudrala Pavan¹,Gomez Juan-Manuel¹

Affiliation:

1. GLOBALFOUNDRIES (United States)

Publisher

SPIE

Reference5 articles.

1. Scatterometry-based metrology for the 14 nm node double patterning lithography;Carau,2015

2. Improvement of depth of focus control using wafer geometry

3. Scatterometry or imaging overlay: a comparative study

4. Diffraction Based Overlay and Image Based Overlay on production flow for advanced technology node;Blancquaert,2013

5. Differential Signal Scatterometry Overlay Metrology: An Accuracy Investigation;Kandel,2007

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving accuracy and sensitivity of diffraction-based overlay metrology;Chinese Optics Letters;2023

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