Scatterometry or imaging overlay: a comparative study-Reference-Cited by-同舟云学术

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Scatterometry or imaging overlay: a comparative study

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Hsu Simon C. C.,Pai Yuan Chi,Chen Charlie,Yu Chun Chi,Hsing Henry,Wu Hsing-Chien,Kuo Kelly T. L.,Amir Nuriel

Publisher

SPIE

Reference9 articles.

1. ITRS 2014 Edition.

2. Innovative Fast Technique for Checking Overlay Accuracy with ASC (Archer Self Calibration);Hsu,2014

3. DCM: device correlated metrology for overlay measurements;Chen,2013

4. Innovative Techniques for Improving Overlay Accuracy by Using DCM (Device Correlated Metrology) Target as Reference;Tzai,2014

5. OVL accuracy fundamentals;Kandel,2012

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Selection of DBO measurement wavelength for bottom mark asymmetry based on FDTD method;Journal of Semiconductors;2019-12-01

2. A diffraction-based overlay model based on FDTD method;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26

3. Scatterometry;CIRP Encyclopedia of Production Engineering;2019

4. Matching between simulations and measurements as a key driver for reliable overlay target design;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-13

5. Scatterometry;CIRP Encyclopedia of Production Engineering;2018

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