Numerical and experimental investigation of the effect of side injectors on the deposition rate near the wafer edge during atmospheric pressure chemical vapor deposition

Author:

Le Ba-Phuoc,Lin Wei-Jie,Chen Jyh-ChenORCID,Hu Chieh,Tu Chun-Chin,Chen Liang-Chin

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference30 articles.

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3. Handbook of Silicon Based MEMS Materials and Technologies;Tilli,2020

4. Computational modeling of a chemical vapor deposition reactor for epitaxial silicon formation;Jeon;Sci. Adv. Mater.,2016

5. Chemical process of silicon epitaxial growth in a SiHCl3-H2 system;Habuka;J. Cryst. Growth,1999

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