1. Toward 3nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography;Arnold,2008
2. Holistic optimization architecture enabling sub-14-nm projection lithography
3. Focus and dose characterization of immersion photoclusters;Brunner,2009
4. Overlay characterization and matching of immersion photoclusters;Minghetti,2010
5. Optical lithography with and without NGL for single-digit nanometer nodes;Lin,2015