Detection and mitigation of furnace anneal induced distortions at the wafer edge

Author:

van Dijk Leon,Charley Anne-Laure,Stokhof Maarten,Otten Ronald,Van Elshocht Sven,Jongbloed Bert,Leray Philippe,van Haren Richard

Publisher

SPIE

Reference8 articles.

1. Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

2. Wafer-shape based in-plane distortion predictions using Superfast 4G metrology;van Dijk,2017

3. Intra-field stress impact on global wafer deformation;van Haren,2019

4. Characterization of Deformation Induced by Micro-Second Laser Anneal Using CGS Interferometry;Owen,2008

5. Lithography overlay control improvement using patterned wafer geometry for sub 22 nm technology nodes;Peterson,2015

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