Directed self-assembly graphoepitaxy template generation with immersion lithography-Reference-Cited by-同舟云学术

Directed self-assembly graphoepitaxy template generation with immersion lithography

Published:2015-09-11 Issue:3 Volume:14 Page:031216
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ma Yuansheng¹,Lei Junjiang¹,Andres Torres J.²,Hong Le¹,Word James²,Fenger Germain³,Tritchkov Alexander²,Lippincott George²,Gupta Rachit²,Lafferty Neal²,He Yuan²,Bekaert Joost⁴,Vanderberghe Geert⁴

Affiliation:

1. Mentor Graphics Corporation, 46885 Bayside Parkway, Fremont, California 94538, United States

2. Mentor Graphics Corporation. 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070, United States

3. Mentor Graphics Corporation, Kapledreef 75, Heverlee 3001, Belgium

4. IMEC, Kapeldreef 75, Leuven B-3001, Belgium

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

2. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats

3. Fabrication of 28nm pitch Si fins with DSA lithography

4. Directed self-assembly defectivity assessment. Part II

5. Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

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3. Technology path-finding framework for directed-self assembly for via layers;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-03-28

4. Directed self-assembly compliant flow with immersion lithography: from material to design and patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-09-29

5. Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning;SPIE Proceedings;2016-03-22