Directed self-assembly compliant flow with immersion lithography: from material to design and patterning-Reference-Cited by-同舟云学术

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

Published:2016-09-29 Issue:3 Volume:15 Page:031610
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ma Yuansheng¹,Wang Yan²,Word James³,Lei Junjiang¹,Mitra Joydeep⁴,Torres Juan Andres³,Hong Le¹,Fenger Germain³,Khaira Daman³,Preil Moshe²,Kye Jongwook²,Levinson Harry J.²

Affiliation:

1. Mentor Graphics Corporation, 46885 Bayside Parkway, Fremont, California 94538, United States

2. GLOBALFOUNDRIES, 2600 Great America Way, Santa Clara, California 95054, United States

3. Mentor Graphics Corporation, 8005 Southwest Boeckman Road, Wilsonville, Oregon 97070, United States

4. Mentor Graphics Corporation, 5000 Plaza on the Lake #310, Austin, Texas 78746, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Fin formation using graphoepitaxy DSA for FinFET device fabrication

2. Fabrication of 28nm pitch Si fins with DSA lithography

3. Directed self-assembly defectivity assessment. Part II

4. Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

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1. Multiple patterning via layout decomposition method for directed self-assembly lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-19

2. Analysis of Flowing in the Immersion Fluid Field under the Oscillatory Motion of the Silicon Wafer;Journal of Physics: Conference Series;2019-06-01

3. Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with Lamella DSA for sub-7 nm technology;SPIE Proceedings;2017-03-30

4. Contribution of EUV mask CD variability on LCDU;SPIE Proceedings;2017-03-24