1. Impact of reticle writing errors on the on-product overlay performance;van Haren,2014
2. Holistic optimization architecture enabling sub-14-nm projection lithography
3. Further beyond – Registration & Overlay Control Enhancements for Optical masks;Gorhad,2014
4. In-die photomask registration and overlay metrology with PROVE® using 2D correlation methods;Seidel,2011
5. Closed Loop Registration Control (RegC®) Using PROVE® as the Data Source for the RegC® Process;Graitzer,2012