Author:
van Haren Richard J. F.,Otten Ronald,Singh Subodh,Singh Amandev,van Dijk Leon,Owen David,Anberg Doug,Mileham Jeffrey,Gu Yajun,Hermans Jan
Reference16 articles.
1. Lithography overlay control improvement using patterned wafer geometry for sub 22 nm technology nodes;Peterson,2015
2. Improvement of process control using wafer geometry for enhanced manufacturability of advanced semiconductor devices;Lee,2015
3. Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
4. Simulation of nonuniform wafer geometry and thin film residual stress on overlay errors;Veeraraghaven,2011
5. Characterization of Deformation Induced by Micro-Second Laser Anneal Using CGS Interferometry;Owen,2008
Cited by
21 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献