Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance-Reference-Cited by-同舟云学术

Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance

Published:2016-03-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Gorhad Kujan¹,Sharoni Ofir¹,Dmitriev Vladimir¹,Cohen Avi¹,van Haren Richard²,Roelofs Christian²,Cekli Hakki Ergun²,Gallagher Emily³,Leray Philippe³,Beyer Dirk⁴,Trautzsch Thomas⁴,Steinert Steffen⁴

Affiliation:

1. Carl Zeiss SMS Ltd. (Israel)

2. ASML (Netherlands)

3. IMEC (Belgium)

4. Carl Zeiss SMS GmbH (Germany)

Publisher

SPIE

Reference8 articles.

1. Further beyond – Registration & Overlay Control Enhancements for Optical masks,;Kujan,2014

2. Higher order feed-forward control of reticle writing error fingerprints;Richard,2015

3. Holistic optimization architecture enabling sub-14-nm projection lithography

4. Closed Loop Registration Control (RegC®) Using PROVE® as the Data Source for the RegC® Process;Erez,2012

5. Investigation on reticle heating effect induced overlay error;Mijung,2014

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