1. Further beyond – Registration & Overlay Control Enhancements for Optical masks,;Kujan,2014
2. Higher order feed-forward control of reticle writing error fingerprints;Richard,2015
3. Holistic optimization architecture enabling sub-14-nm projection lithography
4. Closed Loop Registration Control (RegC®) Using PROVE® as the Data Source for the RegC® Process;Erez,2012
5. Investigation on reticle heating effect induced overlay error;Mijung,2014