Theoretical modelling of phenomena in the pulsed-laser deposition process: Application to Ti targets ablation in low-pressure N2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371659
Reference43 articles.
1. Deposition of high quality TiN films by excimer laser ablation in reactive gas
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4. Excimer laser reactive ablation deposition of silicon nitride films
5. A parametric study of the deposition of the TiN thin films by laser reactive ablation of titanium targets in nitrogen: the roles of the total gas pressure and the contaminations with oxides
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