Deposition of high quality TiN films by excimer laser ablation in reactive gas-Reference-Cited by-同舟云学术

Deposition of high quality TiN films by excimer laser ablation in reactive gas

Published:1993-11 Issue:9 Volume:74 Page:5781-5789
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Mihailescu I. N.,Chitica N.,Nistor L. C.,Popescu M.,Teodorescu V. S.,Ursu I.,Andrei A.,Barborica A.,Luches A.,De Giorgi M. Luisa,Perrone A.,Dubreuil B.,Hermann J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.354198

Reference28 articles.

1. Bond strength optimization of plasma-sprayed Cr2O3 layers by factorial two-level experiments

2. Microstructural and microchemical characterization of hard coatings

3. Diffusion barriers in thin films

4. Electrical characteristics of TiN contacts toNsilicon

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