Excimer laser reactive ablation deposition of silicon nitride films-Reference-Cited by-同舟云学术

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Excimer laser reactive ablation deposition of silicon nitride films

Published:1995-02 Issue:1-4 Volume:86 Page:170-174
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

D'Anna E.,Leggieri G.,Luches A.,Martino M.,Perrone A.,Majni G.,Mengucci P.,Alexandrescu R.,Mihailescu I.N.,Zemek J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference8 articles.

1. Deposition of SiO2 by reactive excimer laser ablation from a SiO target

2. Reactive pulsed laser deposition of thin TiN films

3. Deposition of high quality TiN films by excimer laser ablation in reactive gas

4. The electrophysical properties of silicon nitride at low temperatures

5. IR transmittance studies of hydrogen-free and hydrogenated silicon nitride and silicon oxynitride films deposited by reactive sputtering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physics of Matter: From the Nanoscale Structure to the Macroscopic Properties of Materials;The First Outstanding 50 Years of “Università Politecnica delle Marche”;2019

2. Spectral evolution of nano-second laser interaction with Ti target in nitrogen ambient gas;Applied Physics B;2014-05-07

3. Influences of the nitrogen content on the morphological, chemical and optical properties of pulsed laser deposited silicon nitride thin films;Surface and Coatings Technology;2005-03

4. Pulsed laser deposition of non-stoichiometric silicon nitride (SiNx) thin films;Applied Physics A;2004-09

5. State-of-the-Art Reactive Pulsed Laser Deposition of Nitrides;Japanese Journal of Applied Physics;2002-04-15

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