Fluid simulation of the E-H mode transition in inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3112009
Reference34 articles.
1. Actinometry of inductively coupled Cl2∕N2 plasmas for dry etching of GaAs
2. Characterization of remote inductively coupled CH4–N2 plasma for carbon nitride thin-film deposition
3. Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition
4. Fabrication of low loss two-dimensional InP photonic crystals by inductively coupled plasma etching
5. Industrial applications of low‐temperature plasma physics
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1. Spatial distribution diagnosis of electron temperature and density of argon inductively coupled plasma by tomographic optical emission spectroscopic measurement and collisional-radiative model;Journal of Vacuum Science & Technology A;2024-01-29
2. E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions;Journal of Applied Physics;2023-05-01
3. Fluid simulation of the effect of a dielectric window with high temperature on plasma parameters in inductively coupled plasma;Plasma Science and Technology;2023-01-18
4. The impact of ion mobility coefficients on plasma discharge characteristics;Physics of Plasmas;2022-07
5. Influence of helium metastable states on the E-H mode transition in an inductively coupled plasma;Current Applied Physics;2022-04
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