Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365408
Reference9 articles.
1. Effects of hydrogen atoms on the network structure of hydrogenated amorphous and microcrystalline silicon thin films
2. Microstructures of low‐temperature‐deposited polycrystalline silicon with micrometer grains
3. Effects of process parameters on low‐temperature silicon homoepitaxy by ultrahigh‐vacuum electron‐cyclotron‐resonance chemical‐vapor deposition
4. Low-temperature in situ cleaning of silicon (100) surface by electron cyclotron resonance hydrogen plasma
5. X‐ray diffraction study and electrical characterization of boron‐implanted low‐pressure chemical vapor deposited polycrystalline silicon layers
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