Analysis of a transient region during the initial stage of atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1321775
Reference7 articles.
1. Atomic Layer Deposition of TiN Films by Alternate Supply of Tetrakis(ethylmethylamino)-Titanium and Ammonia
2. A solution to the surface arsenic stoichiometric problem at the GaAs(001) growth surface in atomic layer expitaxy
3. Metal–organic atomic-layer deposition of titanium–silicon–nitride films
4. Atomic layer epitaxy of germanium
5. Kinetic modeling of film growth rates of TiN films in atomic layer deposition
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