Atomic-layer-deposited Al2O3–HfO2–Al2O3 dielectrics for metal-insulator-metal capacitor applications
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2005397
Reference15 articles.
1. RF, DC, and reliability characteristics of ALD HfO/sub 2/-Al/sub 2/O/sub 3/ laminate MIM capacitors for Si RF IC applications
2. High-κ gate dielectrics: Current status and materials properties considerations
3. PVD HfO2 for high-precision MIM capacitor applications
4. A high-density MIM capacitor (13 fF/μm/sup 2/) using ALD HfO2 dielectrics
5. A capacitorless double-gate DRAM cell
Cited by 44 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. White X-Ray Radiation Effects in MOS Capacitors With Atomic Layer Deposited HfO2/Al2O3 and Al2O3/HfO2/Al2O3 Gate Dielectric Stacks for High Total Doses;IEEE Transactions on Device and Materials Reliability;2023-03
2. Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand;Journal of Materials Chemistry C;2022
3. Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition;Nanomaterials;2021-07-09
4. Flexible Al-Ti-Zn-O MIM capacitors fabricated by room temperature atomic layer deposition and their electrical performances;Journal of Alloys and Compounds;2021-07
5. Nanocrystalline polymorphic oxide perovskite-based high-κ low-leakage thin film materials;Thin Solid Films;2020-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3