Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand-Reference-Cited by-同舟云学术

Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand

Published:2022 Issue:17 Volume:10 Page:6696-6709
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Kim Seongyoon¹^ORCID,Hidayat Romel¹^ORCID,Roh Hyeonsu¹^ORCID,Kim Jaemin¹^ORCID,Kim Hye-Lee¹^ORCID,Khumaini Khabib¹²^ORCID,Park Mira³,Seok Jang-Hyeon³,Park Jung Woo³,Lee Won-Jun¹^ORCID

Affiliation:

1. Departments of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul, 05006, Republic of Korea

2. Departments of Chemistry, Universitas Pertamina, Jakarta 12200, Indonesia

3. Thin Film Material Research Team, Hansol Chemical Co., Ltd, Wanju-Gun, Jeonbuk 55321, Republic of Korea

Abstract

We studied the atomic layer deposition (ALD) of titanium oxide (TiO2) thin films using a newly developed heteroleptic titanium precursor with a linked ligand.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/TC/D2TC00574C

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2. Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition

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