Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition
Author:
Affiliation:
1. Department of Chemical Engineering, Hongik University, 94 Wausan-ro, Mapo-gu, Seoul04066, South Korea
2. R&D Division, SK Hynix Inc., 2091 Gyeongchung-daero, Icheon-si, Gyeonggi-do17336, South Korea
Funder
SK Hynix
Hongik University
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.2c04425
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