Novel deuterated cyclopentadienyl zirconium/hafnium precursors for atomic layer deposition of high-performance ZrO2/HfO2 thin films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Novel deuterated cyclopentadienyl zirconium/hafnium precursors for atomic layer deposition of high-performance ZrO2/HfO2 thin films

Published:2024-10 Issue: Volume:40 Page:102354
ISSN:2352-9407
Container-title:Applied Materials Today
language:en
Short-container-title:Applied Materials Today

Author:

Park Sunwoo,Choi Yoona,Park Sangwook,Lee Hayoon,Lee Kiho,Kang Seokwoo,Park Jongwook,Jeon Woojin

Funder

KEIT

Publisher

Elsevier BV

Reference41 articles.

1. Emerging applications for high K materials in VLSI technology;Clark;Materials,2014

2. On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors;Wong;Microelectron. Eng.,2006

3. Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications;Jeon;J. Mater. Res.,2019

4. Band offsets of wide-band-gap oxides and implications for future electronic devices;Robertson;J. Vac. Sci. Technol. B,2000

5. High dielectric constant oxides;Robertson;Eur. Phys. J.-Appl. Phys,2004

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP