The effect of gate metal and SiO2thickness on the generation of donor states at the Si‐SiO2interface
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.334767
Reference36 articles.
1. Generation‐annealing kinetics and atomic models of a compensating donor in the surface space charge layer of oxidized silicon
2. High field current induced‐positive charge transients in SiO2
3. Interface traps generated by internal photoemission in Al‐SiO2‐Si structures
4. Impact ionization model for dielectric instability and breakdown
5. Comparative studies of tunnel injection and irradiation on metal oxide semiconductor structures
Cited by 114 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Observation of gamma radiation-induced defects in radiation-intolerant and radiation-tolerant Si/SiO2 by electron spins resonance and quantitative interpretation;Radiation Effects and Defects in Solids;2022-05-19
2. Detection and Characterization of Single Defects in MOSFETs;Noise in Nanoscale Semiconductor Devices;2020
3. Characterization of positive bias temperature instability concerning interfacial layer thickness of HfSiON/SiO2 nMOSFET;Microelectronics Reliability;2019-09
4. (Invited) Single Defect Characterization at Si/SiO 2 Interface;ECS Transactions;2017-05-01
5. Distribution of the energy levels of individual interface traps and a fundamental refinement in charge pumping theory;Japanese Journal of Applied Physics;2017-02-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3