Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition-Reference-Cited by-同舟云学术

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Published:2016-11 Issue:11 Volume:87 Page:113905
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Dendooven Jolien¹^ORCID,Solano Eduardo¹^ORCID,Minjauw Matthias M.¹,Van de Kerckhove Kevin¹,Coati Alessandro²,Fonda Emiliano²,Portale Giuseppe³^ORCID,Garreau Yves²⁴,Detavernier Christophe¹

Affiliation:

1. Department of Solid State Sciences, COCOON, Ghent University, Krijgslaan 281/S1, B-9000 Ghent, Belgium

2. Synchrotron SOLEIL, L’Orme des Merisiers, Saint-Aubin, BP48, 91192 Gif-sur-Yvette, France

3. DUBBLE Beamline BM26, ESRF European Synchrotron, Avenue des Martyrs, CS40220, 38043 Grenoble, France

4. Matériaux et Phénomènes Quantiques (MPQ), Université Paris Diderot–Paris 7, Sorbonne-Paris-Cité, CNRS, UMR 7162, 10, rue A. Domon et L. Duquet, 75205 Paris Cedex 13, France

Funder

Fonds Wetenschappelijk Onderzoek (FWO)

Bijzonder Onderzoeksfonds (BOF)

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4967711

Reference41 articles.

1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

2. Atomic Layer Deposition: An Overview