Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties-Reference-Cited by-同舟云学术

Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties

Published:2022-06-29 Issue:13 Volume:34 Page:6142-6154
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Filez Matthias¹^ORCID,Feng Ji-Yu¹,Minjauw Matthias M.¹^ORCID,Solano Eduardo²^ORCID,Poonkottil Nithin¹^ORCID,Van Daele Michiel¹^ORCID,Ramachandran Ranjith K.¹,Li Chen³^ORCID,Bals Sara³^ORCID,Poelman Hilde⁴^ORCID,Detavernier Christophe¹^ORCID,Dendooven Jolien¹^ORCID

Affiliation:

1. Conformal Coating of Nanostructures (CoCooN), Department of Solid State Sciences, Ghent University, Krijgslaan 281 (S1), 9000 Ghent, Belgium

2. NCD-SWEET Beamline, ALBA Synchrotron Light Source, Carrer de la Llum 2-26, 08290 Cerdanyola del Vallès, Spain

3. Electron Microscopy for Materials Research (EMAT), University Antwerpen, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium

4. Laboratory for Chemical Technology, Ghent University, Technologiepark 125, Zwijnaarde, B-9052 Ghent, Belgium

Funder

FP7 People: Marie-Curie Actions

CALIPSOplus

Fonds Wetenschappelijk Onderzoek

FWO postdoctoral research fellowship

MICINN/FEDER funds

Special Research Fund BOF of Ghent University

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c01304

Reference23 articles.

1. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

2. Atomic Layer Deposition: An Overview

3. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

4. New development of atomic layer deposition: processes, methods and applications

5. Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review

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