New development of atomic layer deposition: processes, methods and applications-Reference-Cited by-同舟云学术

New development of atomic layer deposition: processes, methods and applications

Published:2019-05-23 Issue:1 Volume:20 Page:465-496
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Oviroh Peter Ozaveshe¹,Akbarzadeh Rokhsareh¹,Pan Dongqing²,Coetzee Rigardt Alfred Maarten¹,Jen Tien-Chien¹

Affiliation:

1. Mechanical Engineering Science Department, Faculty of Engineering and the Built Environment, University of Johannesburg, Johannesburg, South Africa

2. Department of Engineering Technology, University of North Alabama, Florence, AL, USA

Publisher

Informa UK Limited

Subject

General Materials Science

Link

https://tandfonline.com/doi/pdf/10.1080/14686996.2019.1599694

Reference248 articles.

1. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

2. Atomic layer epitaxy

3. Thin film deposition technologies and processing of biomaterials

4. On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach

5. Applications of atomic layer deposition to nanofabrication and emerging nanodevices

Cited by 335 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ultra-high conductivity exploration and applications with multilayer heterostructure in solid oxide fuel cells: A review;Journal of Alloys and Compounds;2024-11

2. Enhanced thermoelectric properties of 3D printed Bi2Te2.7Se0.3 by atomic interface engineering;Journal of Alloys and Compounds;2024-11

3. Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings;Journal of Vacuum Science & Technology A;2024-09-09

4. V.B. Aleskovskii's Leading Scientific Highly Organized Substance Chemistry School: from Fundamental Research to Widespread Practical Implementation;Журнал неорганической химии;2024-09-05

5. Effects of oxygen sources on the growth characteristics and dielectric properties of atomic-layer-deposited TiO2 films for aluminum electrolytic capacitors;Journal of Solid State Chemistry;2024-09