Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based <i>in situ</i> and <i>operando</i> atomic layer deposition research-Reference-Cited by-同舟云学术

Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research

Published:2022-01-01 Issue:1 Volume:93 Page:013905
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Kokkonen E.¹^ORCID,Kaipio M.²^ORCID,Nieminen H.-E.²^ORCID,Rehman F.³,Miikkulainen V.⁴^ORCID,Putkonen M.⁵^ORCID,Ritala M.⁵^ORCID,Huotari S.⁶^ORCID,Schnadt J.¹⁷^ORCID,Urpelainen S.⁸^ORCID

Affiliation:

1. MAX IV Laboratory, Lund University, Box 118, 221 00 Lund, Sweden

2. Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland

3. Division of Synchrotron Radiation Research, Department of Physics, Lund University, P.O. Box 118, 221 00 Lund, Sweden

4. Department of Chemistry and Materials Science, Aalto University, 00076 Aalto, Finland

5. Department of Chemistry, University of Helsinki, 00014 Helsinki, Finland

6. Department of Physics, University of Helsinki, 00014 Helsinki, Finland

7. Division of Synchrotron Radiation Research, Department of Physics, Lund University, Box 118, 221 00 Lund, Sweden

8. Nano and Molecular Systems Research Unit, University of Oulu, 90014 Oulu, Finland

Funder

Academy of Finland

Vetenskapsrådet

Swedish Agency for Innovation Systems

Svenska Forskningsrådet Formas

Publisher

AIP Publishing

Subject

Instrumentation

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0076993

Reference76 articles.

1. Atomic Layer Epitaxy

2. In SituStudies on Reaction Mechanisms in Atomic Layer Deposition

3. Mechanisms of surface reactions in thin solid film chemical deposition processes

4. Understanding chemical and physical mechanisms in atomic layer deposition

5. Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of MoO3 and TixMoyOz Thin Films Prepared by Atomic Layer Deposition;Russian Journal of Inorganic Chemistry;2024-03-11

2. Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates;Inorganics;2023-12-14

3. Time evolution of surface species during the ALD of high-k oxide on InAs;Surfaces and Interfaces;2023-07

4. Combining the Δ-Self-Consistent-Field and GW Methods for Predicting Core Electron Binding Energies in Periodic Solids;Journal of Chemical Theory and Computation;2023-05-10

5. Photocatalytic setup for in situ and operando ambient-pressure X-ray photoelectron spectroscopy at MAX IV Laboratory;Journal of Synchrotron Radiation;2023-04-17