Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges-Reference-Cited by-同舟云学术

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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Published:2011-09 Issue:5 Volume:29 Page:050801
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Profijt H. B.,Potts S. E.,van de Sanden M. C. M.,Kessels W. M. M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3609974

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