A Tracer Method for the Thickness Measurement of Thin Bi Films
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1746333
Reference18 articles.
1. Oxide films on liquid metals studied by means of electron-diffraction
2. Rapid and Direct Measurement of Vapor Pressure of Liquid Metals
3. A Device to Deposit Automatically the Proper Thickness of Metals Used in Shadow‐Casting in Electron Microscopy
4. An X‐Ray Method for Measuring the Thickness of Thin Crystalline Films
5. An X‐Ray Method for Measuring the Thickness of Thin Crystalline Films
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. APPLICATION OF RADIOACTIVITY IN THE METALLURGICAL, ENGINEERING AND ELECTRICAL INDUSTRIES;The Technical Applications of Radioactivity;1966
2. The nucleation, growth, structure and epitaxy of thin surface films;Advances in Physics;1965-07
3. Use of Optical Density Measurements of Thin Films to Determine Vapor Distributions;Review of Scientific Instruments;1963-07
4. A radioactive technique for the continuous measurement of film thickness in vacuum deposited gold films;The International Journal of Applied Radiation and Isotopes;1962-01
5. CVI. The sensitivity of electron diffraction as a means of detecting thin surface films: I;The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science;1955-09
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