CVI. The sensitivity of electron diffraction as a means of detecting thin surface films: I-Reference-Cited by-同舟云学术

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CVI. The sensitivity of electron diffraction as a means of detecting thin surface films: I

Published:1955-09 Issue:380 Volume:46 Page:927-940
ISSN:1941-5982
Container-title:The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science
language:en
Short-container-title:The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science

Author:

Newman R.C.,Pashley D.W.

Publisher

Informa UK Limited

Link

http://www.tandfonline.com/doi/pdf/10.1080/14786440908520612

Reference11 articles.

1. A Tracer Method for the Thickness Measurement of Thin Bi Films

2. One-dimensional dislocations. I. Static theory

3. An electron-diffraction examination of thin films of lithium fluoride and copper prepared by vacuum evaporation

4. An electron diffraction specimen chamber with a specimen vacuum lock

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Epitaxy growth mechanisms;Materials Science and Technology;1999-01

2. A tabulation and classification of the structures of clean solid surfaces and of adsorbed atomic and molecular monolayers as determined from low energy electron diffraction patterns;Progress in Surface Science;1986-01

3. A reflection electron diffraction study on some metal oxide solar collector coatings: Part I;Thin Solid Films;1984-09

4. Analytical Electron Microscopy;Transmission Electron Microscopy;1984

5. Practical reflection electron diffraction;Progress in Crystal Growth and Characterization;1982-01

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