Surface reaction probability in hydrogenated amorphous silicon growth
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.357494
Reference23 articles.
1. Hydrogenated amorphous silicon films deposited by reactive sputtering: The electronic properties, hydrogen bonding and microstructure
2. Characterization of reactively magnetron sputtered hydrogenated amorphous silicon films
3. Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon
4. Radical species in argon‐silane discharges
5. Spatial distribution ofa‐Si:H film‐producing radicals in silane rf glow discharges
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