Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336920
Reference14 articles.
1. Interface morphology in chemical vapour deposition on profiled substrates
2. Step coverage simulation and measurement in a dc planar magnetron sputtering system
3. Calculation of Evaporated Film Thickness Distribution on Nonplanar Surfaces for Variable Angle Vapor Incidence
4. SiO2 planarization by two-step rf bias-sputtering
5. Plasma‐deposited thin‐film step coverage calculated by computer simulation
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