Plasma‐deposited thin‐film step coverage calculated by computer simulation

Author:

Ross R. C.,Vossen J. L.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-12

2. High-Efficiency Amorphous Silicon Solar Cell on a Periodic Nanocone Back Reflector;Advanced Energy Materials;2012-04-13

3. Deposition of Barrier Layers for Thin Film Solar Cells Assisted by Bipolar Substrate Biasing;Plasma Processes and Polymers;2009-06

4. Feature-Scale to Wafer-Scale Modeling and Simulation of Physical Vapor Deposition;Dispersive Transport Equations and Multiscale Models;2004

5. Continuum model of thin film deposition incorporating finite atomic length scales;Journal of Applied Physics;2002-10

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