Step coverage simulation and measurement in a dc planar magnetron sputtering system
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332414
Reference5 articles.
1. Optimization of Al step coverage through computer simulation and scanning electron microscopy
2. Angular distribution of sputtered atoms from polycrystalline metal targets
3. Simulation of ion‐beam etched pattern profiles
4. A sputtering technique for coating the inside walls of through-holes in substrates
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