Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation-Reference-Cited by-同舟云学术

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Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation

Published:2013-12 Issue: Volume:316 Page:249-256
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Ramisch E.,Mutzke A.,Schneider R.,Stroth U.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference26 articles.

1. A. Mutzke, R. Schneider, IPP-Report, 12/4, 2009.

2. German Patent. De 197 39894.4-33.

3. Duo-Plasmaline — a linearly extended homogeneous low pressure plasma source

4. J. Kopecki, Untersuchung zur plasmagestützten Abscheidung von Barriere-schichten für flexible dünnschichtsolarzellen, Diploma thesis, Universität Stuttgart, Stuttgart, 2008.

5. W. Eckstein, R. Dohmen, A. Mutzke, R. Scheinder, IPP-Report, 12/3, 2007.

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