Spatial distribution ofa‐Si:H film‐producing radicals in silane rf glow discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345292
Reference29 articles.
1. Dissociation cross sections of silane and disilane by electron impact
2. Total and partial electron collisional ionization cross sections for CH4, C2H6, SiH4, and Si2H6
3. a-Si:H Deposition from SiH4and Si2H6rf-Discharges: Pressure and Temperature Dependence of Film Growth in Relation to α-γ Discharge Transition
4. Laser‐induced fluorescence spectroscopy for the determination of the absolute density and spatial distribution of Si atoms in a SiH4‐He‐Ar glow discharge
5. Laser diagnostics of a silane plasma—SiH radicals in an a‐Si:H chemical vapor deposition system
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