Chemical vapor deposition of MnxNy films from bis(2,2,6,6-tetramethylpiperidido)manganese(II) and ammonia-Reference-Cited by-同舟云学术

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Chemical vapor deposition of MnxNy films from bis(2,2,6,6-tetramethylpiperidido)manganese(II) and ammonia

Published:2016-11 Issue:6 Volume:34 Page:060603
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Mohimi Elham¹,Trinh Brian B.²,Babar Shaista¹,Girolami Gregory S.²,Abelson John R.¹

Affiliation:

1. Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, 1304 W. Green St., Urbana, Illinois 61801

2. School of Chemical Sciences, University of Illinois at Urbana-Champaign, 505 South Mathews Avenue, Urbana, Illinois 61801

Funder

National Science Foundation (NSF)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://scitation.aip.org/deliver/fulltext/avs/journal/jvsta/34/6/1.4964839.pdf?itemId=/content/avs/journal/jvsta/34/6/10.1116/1.4964839&mimeType=pdf&containerItemId=content/avs/journal/jvsta

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Some properties of metal organic chemical vapor deposited (MOCVD) manganese nitride thin films (MnxNy) obtained using a single precursor of Tetraamminebis-(hexamethylenetetrammine) manganese (II) chloride [Mn (HMTA)2(NH3)4] Cl2;Physica B: Condensed Matter;2023-11

2. Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma;Journal of Vacuum Science & Technology A;2023-05-23

3. Mn boosted the electrocatalytic hydrogen evolution of N, P co-doped Mo₂C via synergistically tuning the electronic structures;Sustainable Energy & Fuels;2022

4. Plasma-Enhanced Atomic Layer Deposition of Low Resistivity and Ultrathin Manganese Oxynitride Films with Excellent Resistance to Copper Diffusion;ACS Applied Electronic Materials;2020-05-21

5. Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials;RSC Advances;2020

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