Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas

Published:2015-06-17 Issue:23 Volume:117 Page:233302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:J. Appl. Phys.

Author:

Zhang Yiting¹^ORCID,Zafar Abdullah²,Coumou David J.³^ORCID,Shannon Steven C.²,Kushner Mark J.¹

Affiliation:

1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, Michigan 48109, USA

2. Nuclear Engineering Department, North Carolina State University, 2500 Stinson Drive, Raleigh, North Carolina 27695, USA

3. MKS Instruments, Inc. 100 Highpower Road, Rochester, New York 14623, USA

Funder

MKS Instruments

National Science Foundation (NSF)

Semiconductor Research Corporation (SRC)

Lam Research Corporation (Lam Research)

U.S. Department of Energy (Department of Energy)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4922631

Reference42 articles.

1. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

2. Dual radio-frequency discharges: Effective frequency concept and effective frequency transition

3. Ion energy distribution control in single and dual frequency capacitive plasma sources

4. Experimental investigations of electron density and ion energy distributions in dual-frequency capacitively coupled plasmas for Ar/CF4 and Ar/O2/CF4 discharges

5. Control of ion energy distribution at substrates during plasma processing

Cited by 54 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Damage-Free Plasma Source for Atomic-Scale Processing;Nano Letters;2024-09-06

2. Experimental investigation of an electronegative cylindrical capacitively coupled geometrically asymmetric plasma discharge with an axisymmetric magnetic field;Physics of Plasmas;2024-08-01

3. Future of plasma etching for microelectronics: Challenges and opportunities;Journal of Vacuum Science & Technology B;2024-06-07

4. Study of synchronous RF pulsing in dual frequency capacitively coupled plasma;Plasma Sources Science and Technology;2024-03-01

5. Effect of a negative DC bias on a capacitively coupled Ar plasma operated at different radio frequency voltages and gas pressures;Plasma Science and Technology;2023-12-22

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3