Control of ion energy distribution at substrates during plasma processing
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.373715
Reference11 articles.
1. Ion energetics in electron cyclotron resonance discharges
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4. Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions
5. Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition
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