Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition-Reference-Cited by-同舟云学术

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Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition

Published:1994-07 Issue:4 Volume:12 Page:1360-1364
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Martinu L.,Klemberg‐Sapieha J. E.,Küttel O. M.,Raveh A.,Wertheimer M. R.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579322

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