Cylindrical magnetron discharges. I. Current‐voltage characteristics for dc‐ and rf‐driven discharge sources
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.343395
Reference14 articles.
1. Magnetron sputtering: basic physics and application to cylindrical magnetrons
2. High rate sputtering techniques
3. Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures
4. The dependence of deposition rate on power input for dc and rf magnetron sputtering
5. Secondary electron effect on power–voltage relationship in rf sputtering
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