Reaction of fluorine atoms with SiO2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.325755
Reference8 articles.
1. Control of relative etch rates of SiO2 and Si in plasma etching
2. The etching of silicon with XeF2vapor
3. The etching of silicon with XeF2vapor
4. Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
5. Chemiluminescent titration of F(g) with Cl2(g) and microwave production of atomic fluorine
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