The etching of silicon with XeF2vapor
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.90562
Reference9 articles.
1. Plasma etching in integrated circuit manufacture—A review
2. Plasma reactor design for the selective etching of SiO2 on Si
3. A New Chemical Dry Etching
4. The Loading Effect in Plasma Etching
5. Plasma etching A ’’pseudo‐black‐box’’ approach
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