Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.325382
Reference16 articles.
1. A Study of the Optical Emission from an rf Plasma during Semiconductor Etching
2. Chemiluminescence excited by atomic fluorine
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4. Chemiluminescent titration of F(g) with Cl2(g) and microwave production of atomic fluorine
5. MODES OF PROPAGATING LIGHT WAVES IN THIN DEPOSITED SEMICONDUCTOR FILMS
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