The role of the auxiliary atomic ion beam in C60+–Ar+co-sputtering-Reference-Cited by-同舟云学术

The role of the auxiliary atomic ion beam in C60+–Ar+co-sputtering

Published:2011 Issue:5 Volume:136 Page:941-946
ISSN:0003-2654
Container-title:The Analyst
language:en
Short-container-title:Analyst

Author:

Lin Wei-Chun,Liu Chi-Ping,Kuo Che-Hung,Chang Hsun-Yun,Chang Chi-Jen,Hsieh Tung-Han,Lee Szu-Hsian,You Yun-Wen,Kao Wei-Lun,Yen Guo-Ji,Huang Chih-Chieh,Shyue Jing-Jong

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrochemistry,Spectroscopy,Environmental Chemistry,Biochemistry,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2011/AN/C0AN00642D

Reference23 articles.

1. Molecular sputter depth profiling using carbon cluster beams

2. Cluster secondary ion mass spectrometry of polymers and related materials

3. A C60 Primary Ion Beam System for Time of Flight Secondary Ion Mass Spectrometry: Its Development and Secondary Ion Yield Characteristics

4. Sputter-induced chemical transformation in oxoanions by combination of C60+ and Ar+ ion beams analyzed with X-ray photoelectron spectrometry

5. Sputter damage in Si (001) surface by combination of C60+ and Ar+ ion beams

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4. Parallel detection, quantification, and depth profiling of peptides with dynamic-secondary ion mass spectrometry (D-SIMS) ionized by C60+–Ar+ co-sputtering;Analytica Chimica Acta;2012-03

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