Sputter damage in Si (001) surface by combination of C60+ and Ar+ ion beams-Reference-Cited by-同舟云学术

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Sputter damage in Si (001) surface by combination of C60+ and Ar+ ion beams

Published:2008-12 Issue:5 Volume:255 Page:2490-2493
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Yu Bang-Ying,Lin Wei-Chun,Chen Ying-Yu,Lin Yu-Chin,Wong Ken-Tsung,Shyue Jing-Jong

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference16 articles.

1. Ion bombardment of polyimide films

2. Depth Profiling of Organic Films with X-ray Photoelectron Spectroscopy Using C60+ and Ar+ Co-Sputtering

3. Nickel-chromium interface resolution in Auger depth profiles

4. The development of a range of C60 ion beam systems

5. The development of C60 and gold cluster ion guns for static SIMS analysis

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interpenetration of CH3NH3PbI3 and TiO2 improves perovskite solar cells while TiO2 expansion leads to degradation;Physical Chemistry Chemical Physics;2017

2. Comparing depth profiling of oxide scale on SOFC interconnect-materials using ToF-SIMS with69Ga+, Bi3+/Cs+and C60+/C602+as primary and sputter ions;Materials at High Temperatures;2015-01

3. Cluster Secondary Ion Mass Spectrometry (SIMS) For Semiconductor and Metals Depth Profiling;Cluster Secondary Ion Mass Spectrometry;2013-04-15

4. Dramatically Enhanced Oxygen Uptake and Ionization Yield of Positive Secondary Ions with C60+ Sputtering;Analytical Chemistry;2012-03-19

5. Parallel detection, quantification, and depth profiling of peptides with dynamic-secondary ion mass spectrometry (D-SIMS) ionized by C60+–Ar+ co-sputtering;Analytica Chimica Acta;2012-03

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