Molecular sputter depth profiling using carbon cluster beams

Author:

Wucher Andreas,Winograd Nicholas

Publisher

Springer Science and Business Media LLC

Subject

Biochemistry,Analytical Chemistry

Reference69 articles.

Cited by 40 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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2. Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS;International Journal of Mass Spectrometry;2018-07

3. Gas Cluster Ion Beams for Secondary Ion Mass Spectrometry;Annual Review of Analytical Chemistry;2018-06-12

4. Quantification of organic materials by ion implantation;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2018-05

5. ToF-SIMS analysis of ion implanted standard to quantify insecticide in mosquito netting with cesium and argon gas cluster sputtering beams;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2018-05

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