Competitive Adsorption as a Route to Area-Selective Deposition
Author:
Funder
Semiconductor Research Corporation
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b22065
Reference51 articles.
1. Preface: Special Topic on Atomic and Molecular Layer Processing: Deposition, Patterning, and Etching
2. Perspective: New process technologies required for future devices and scaling
3. Selective vapor-phase deposition on patterned substrates
4. Selective epitaxy of GaAs, AlxGa1−xAs, and InxGa1−xAs
5. Current status of selective area epitaxy by OMCVD
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